Guangdong JSWAY CNC Machine Tool Co., Ltd. since 2004.
JSWAY WU800 6 Axes Interpolate Y-Axis Dual Electric Spindle Dual Upper Power Turret Machine317
1. The technology JSWAY adopts is at the forefront of industry.
2. It is rigorously tested to ensure high durability as per quality standards.
3. This product has achieved world-class standards of quality and cost performance ratio.
4. High performance of gives Zhongshan JSTOMI CNC Machine Tool Co., Ltd. a significant competitive advantage.
Company Features
1. [JSWAY is now making great achievements in the industry.
2. We have clean manufacturing environment. Our manufacturing has been designed to control the air quality, temperature, and humidity where it is regulated in order to protect sensitive equipment and products from contamination.
3. The aim of JSWAY is to create good accomplishments in the sector of . Contact! Our ultimate aim is to become a worldwide competitive exporter. Contact! Zhongshan JSTOMI CNC Machine Tool Co., Ltd. is committed to continuous improvement and constant innovation. Contact! Zhongshan JSTOMI CNC Machine Tool Co., Ltd. is dedicated to spreading the reputation of its own brand. Contact!
1.Professional sales person and technical team to lead you to invest the project with best budget.Turn-key project offering.
2.Quality control,high technology productivity to make sure the good quality machine production.
3.1 year warranty was provided since the date of delivery. In 1 year's warranty,For small problems about the machine,our profesional after-sales team will help to solve on line.For big problem,we will dispatch the engineer to your factory to solve problem.Large experienced engineer team is ready to serve all of you in the whole world.
Technical Data
This equipment is used for etching. The theory is that chemical activity particles, which produced by glow discharge based on high frequency excitation in vacuum, reacts with the etch material and became volatile matter. The furnace is especially suited for etching of the peripheral doped silicon in solar cell production. And also used for etching and removing photoresist of poly-silicon and Si3N4 in semiconductor process.
Technical Parameters
Wafer size | 125mm×125mm; 156mm×156mm |
Vacuum | ≤2Pa |
RF power | 13.56MHz,Power Consumption:≤1000W |
Temperature | 5-38℃ |
Humidity | 80% |
Power | Three phase, 380V±10%, 50Hz; single phase: 20V±10%,50Hz |
Control loop | DC24V; SOL:AC100V |